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  • Note for the use of pulsed electroplating power supply
  • 2021/10/26
  • Note for the use of pulsed electroplating power supply

    Pulse electroplating power supply has the following precautions during use:

    The interval between the pulse plating power supply and the plating tank In order to ensure that the pulse current waveform is introduced into the plating tank, it is expected that the distance between the pulse plating power supply and the plating tank is 2-3m, otherwise the rear edge of the current (descent line) of the pulse current waveform is greater, and the plating will not reach the desired effect.Second, Yin, anode wire connection method of DC power wire connection method, not suitable for the pulse power connection, the output of pulse electroplating power connection, expect the pole capacitance between the two wires can offset the wire transmission inductance effect, so the best way to Yin, anode wire is double pair, lead to the trough edge, and then adhere to the pulse waveform unchanged.1. Because it is a pulse power supply, in order to avoid the transition effect, multiple core wire should be selected as the connection line of the pulse power supply to the plating trough, and multiple core wire is twisted, and the line capacitance capacitor can offset the inductance effect.2. The standard of the wire must be satisfied with the rated current passed through. Since the current density of the pulse current is much larger than that of the uniform current, it is necessary to consider the current thermal effect of the current that can accept the pulse power supply to ensure the minimum attenuation of the pulse power supply to the plating trough.For example: pulse current is 1000A, duty cycle is 60%, obvious uniform current is 600A, and rated current is: (100060%) 1.3780A, rated value best selected 800A wire.

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